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N. Chowdhury
N. Chowdhury
SEMATECH
Metal gate
Electronic engineering
Optoelectronics
Dielectric
Leakage (electronics)
3
Papers
34
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PROGRESSIVE BREAKDOWN CHARACTERISTICSOFHIGH-K/METAL GATE
2007
International Reliability Physics Symposium
G. Bersuker
N. Chowdhury
Chadwin D. Young
Dawei Heh
Durgamadhab Misra
andR . Choi
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Progressive Breakdown Characteristics of High-K/Metal Gate Stacks
2007
IRPS | International Reliability Physics Symposium
Gennadi Bersuker
N. Chowdhury
Chadwin D. Young
Dawei Heh
Durgamadhab Misra
Rino Choi
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High Performing pMOSFETs on Si(110) for Application to Hybrid Orientation Technologies -- Comparison of HfO 2 and HfSiON
2006
IEDM | International Electron Devices Meeting
Siddarth Krishnan
H. Rusty Harris
P. D. Kirsch
C. Krug
C. Quevedo-Lopez
Chadwin D. Young
Byoung Hun Lee
Rino Choi
N. Chowdhury
S. Suthram
Scott E. Thompson
G. Bersuker
R. Jammy
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Citations (4)
1