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K. G. Knapp
K. G. Knapp
Sulfonate
Trifluoromethanesulfonate
Acid catalysis
Photoresist
Photochemistry
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Photoacid generator study for a chemically-amplified negative resist for high resolution lithography
1998
Paul M. Dentinger
K. G. Knapp
Geoffrey W. Reynolds
James W. Taylor
Theodore H. Fedynyshyn
T. A Richardson
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