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kou nakamura
kou nakamura
Showa Denko
Materials science
Semiconductor device
Optoelectronics
Polishing
Oxide
4
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Mn2O3 Slurry Reuse for SiO2 Film CMP
2011
Sadahiro Kishii
tei hirosi kisii
Ko Nakamura
kou nakamura
Kenzo Hanawa
kenzou hanawa
Satoru Watanabe
satosi watanabe
Yoshihiro Arimoto
yu hirosi arimoto
Syuhei Kurokawa
syuuhei kurokawa
Toshiro Doi
tosirou toi
sadahiro kisii
kou nakamura
kenzou hanawa
satoru watanabe
yosihiro arimoto
syuuhei kurokawa
tosirou doi
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リサイクルが可能な酸化マンガン研磨剤の開発 (特集 第25回環境賞/環境技術をめぐる最近の動向) -- (第25回環境賞 優良賞)
1998
yu hirosi arimoto
tei hirosi kisii
kou nakamura
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A method of making an abrasive agent manufacturing method and a semiconductor device using a Mn oxide and abrasive grains
1996
kou nakamura
kenzou hanawa
tei hirosi kisii
yu hirosi arimoto
sei nama ueda
meiryou hatada
rintarou suzuki
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Method of manufacturing a polishing agent, polishing method and a semiconductor device
1996
kou nakamura
kenzou hanawa
tei hirosi kisii
yu hirosi arimoto
sei nama ueda
meiryou hatada
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