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A. Le Gouil

7

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Process monitoring and surface characterization with in-line XPS metrology

2007 Solid State Technology
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Poly-Si∕TiN∕HfO2 gate stack etching in high-density plasmas

2007 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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Comprehensive study of metal-fluoride crystals issues with trench first hard mask back end architecture

2007
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Chemical analysis of deposits formed on the reactor walls during silicon and metal gate etching processes

2006 Journal of Vacuum Science & Technology B
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Etching of high k/metal gates in high density plasmas

2005
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Plasma etching of metal/high k gate stack

2005
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