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Ik-Hyun Jeong
Ik-Hyun Jeong
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Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing
2020
Ik-Hyun Jeong
Seung-Woo Koo
Hyun-Sok Kim
Jung-Il Hwang
Dong-Jin Lee
Min-Shik Kim
Jae-Wuk Ju
Kang-Min Lee
Young-Sik Kim
Cees Lambregts
Rizvi Rahman
Marc Hauptmann
Raheleh Pishkari
Allwyn Boustheen
Kwang-Young Hu
Paul Böcker
Dong-Hak Lee
In-Ho Joo
Kang-San Lee
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Optical Overlay measurement accuracy improvement with Machine Learning
2020
Alexander Verner
Hyun-Sok Kim
Ik-Hyun Jeong
Seung-Woo Koo
Dong-Jin Lee
Honggoo Lee
Boaz Ophir
Ohad Bachar
Liran Yerushalmi
Sanghuck Jeon
Dongsub Choi
Jeongpyo Lee
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Scanner and etch co-optimized corrections for better overlay and CD control
2019
Ik-Hyun Jeong
Seung-Woo Koo
Hyun-Sok Kim
Jae-Wuk Ju
Young-Sik Kim
Yong-Tae Cho
Heung-Joo Kim
Katja Viatkina
Tom van Hemert
Ruud de Wit
David Deckers
Owen Chen
Nang-Lyeom Oh
Marcus Musselman
Marcus Carbery
Ssuwei Chen
Lucian Schmidt
Heidi Kwon
Jae Gyoo Lee
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Improved wafer alignment model algorithm for better on-product overlay
2019
Ik-Hyun Jeong
Hyun-Sok Kim
Yeong-Oh Kong
Ji-Hyun Song
Jae-Wuk Ju
Young-Sik Kim
Cees Lambregts
Miao Yu
Rizvi Rahman
Leendertjan Karssemeijer
Elliott McNamara
Paul Böcker
Jong-Cheol Choi
Nang-Lyeom Oh
Kangsan Lee
Jin Seo Lee
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