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G. E. Lux
G. E. Lux
Secondary ion mass spectrometry
Ion
Analytical chemistry
Chemistry
Ion implantation
5
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29
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Secondary ion mass spectrometry quantification of elements in TiSi2, TiN, and TiW matrices
1993
Journal of Vacuum Science and Technology
G. E. Lux
F.A. Stevie
P. M. Kahora
R. G. Wilson
G. W. Cochran
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Depth profiling and secondary ion mass spectrometry relative sensitivity factors and systematics for polymers/organics
1993
Journal of Applied Physics
R. G. Wilson
G. E. Lux
C.L. Kirschbaum
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Depth profiles, projected ranges, and secondary ion mass spectrometry relative sensitivity factors for more than 50 elements from hydrogen to uranium implanted into metals
1992
Surface & Coatings Technology
R. G. Wilson
F.A. Stevie
G. E. Lux
C.L. Kirschbaum
S. Frank
J. Pallix
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Round-Robin Study of Implants in Si and SiO2 by SIMS, RBS, and NAA
1990
Peter Roitman
David S. Simons
P. H. Chi
Richard M. Lindstrom
G. E. Lux
S Baumann
Steven W. Novak
R. G. Wilson
D Farrington
J. Keenan
F.A. Stevie
J. L. Moore
R. B. Irwin
A. J. Filo
Charles W. Magee
R Alcorn
D. File
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Physical Separates from the Murchison Meteorite
1982
Meteoritics
M. Dziczkaniec
G.R. Lumpkin
G. E. Lux
B. Srinivasan
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