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M. Neiser
M. Neiser
Molecule
Outgassing
Resist
Organic chemistry
Chemistry
3
Papers
15
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Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing
1999
Journal of Photopolymer Science and Technology
F. M. Houlihan
Ilya L. Rushkin
Richard S. Hutton
Allen G. Timko
Elsa Reichmanis
Omkaram Nalamasu
Allen H. Gabor
Arturo N. Medina
Sanjay Malik
M. Neiser
Roderick R. Kunz
D. K. Downs
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Citations (5)
Resist outgassing as a function of differing photoadditives
1999
Francis M. Houlihan
Ilya L. Rushkin
Richard S. Hutton
Allen G. Timko
Omkaram Nalamasu
Elsa Reichmanis
Allen H. Gabor
Arturo N. Medina
Sanjay Malik
M. Neiser
Roderick R. Kunz
D. K. Downs
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Citations (9)
A study of resist outgassing as a function of differing photoadditives
1999
F. M. Houlihan
Ilya L. Rushkin
Richard S. Hutton
Allen G. Timko
Omkaram Nalamasu
Elsa Reichmanis
Allen H. Gabor
Arturo N. Medina
Sanjay Malik
M. Neiser
Roderick R. Kunz
D. K. Downs
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Citations (1)
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