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Ching Yuan Ho
Ching Yuan Ho
National Tsing Hua University
Dielectric
Oxide
Analytical chemistry
NAND gate
Electronic engineering
5
Papers
23
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Effect of Rapid Thermal Annealing in N2 and Stacked Layer on SiO2?Al2O3?SiO2 Characteristics for Interpoly Silicon Dielectrics
2009
Japanese Journal of Applied Physics
Ching Yuan Ho
Chenhsin Lien
C. H. Liu
Y.-M. Lin
S. Pittikoun
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A novel Multi - Nitridation ONO interpoly dielectric (MN-ONO) for highly reliable and high performance NAND Flash memory
2009
VLSI-TSA | International Symposium on VLSI Technology, Systems, and Applications
C. H. Liu
Y.-M. Lin
Y. Sakamoto
R.J. Yang
D. Y. Yin
P. J. Chiang
Houng-Chi Wei
Ching Yuan Ho
S. H. Chen
H.P. Hwang
C. H. Hung
S. Pittikoun
S. Aritome
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Effect of Rapid Thermal Annealing in N2and Stacked Layer on SiO2–Al2O3–SiO2Characteristics for Interpoly Silicon Dielectrics
2009
Japanese Journal of Applied Physics
Ching Yuan Ho
Chenhsin Lien
C. H. Liu
Y.-M. Lin
S. Pittikoun
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Investigation of Sidewall Oxidation on WSix Gates for Nano-Scale NAND Flash Memory Cells
2008
Japanese Journal of Applied Physics
Ching Yuan Ho
Chenhsin Lien
Po-Jui Chiang
Kai-Yao. Shih
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Improvement of Interpoly Dielectric Characteristics by Plasma Nitridation and Oxidation for Future nand Flash Memory
2008
IEEE Electron Device Letters
Ching Yuan Ho
Chenhsin Lien
Y. Sakamoto
Ru-Jye Yang
Hiro Fijita
C. H. Liu
Y.-M. Lin
S. Pittikoun
S. Aritome
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Citations (19)
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