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Effect of Rapid Thermal Annealing in N2and Stacked Layer on SiO2–Al2O3–SiO2Characteristics for Interpoly Silicon Dielectrics
Effect of Rapid Thermal Annealing in N2and Stacked Layer on SiO2–Al2O3–SiO2Characteristics for Interpoly Silicon Dielectrics
2009
Ching Yuan Ho
Chenhsin Lien
C. H. Liu
Y.-M. Lin
S. Pittikoun
Keywords:
Annealing (metallurgy)
Dielectric
Optoelectronics
Optics
Physics
Silicon
Correction
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