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Zc Le
Zc Le
Jilin University
Atomic physics
Microstructure
Reactive-ion etching
Plasma
Resist
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Application of Reactive Ion Etching to the Fabrication of Microstructure on Mo/Si Multilayer
1999
Chinese Physics Letters
Zc Le
L Dreeskornfeld
S Rahn
R Segler
Ulf Kleineberg
Ulrich Heinzmann
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