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Ferdinand Rosas
Ferdinand Rosas
Photolithography
Photoresist
Resist
Anti-reflective coating
Optics
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Papers
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Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications
2010
Proceedings of SPIE
Joyce Lowes
Victor Pham
Jim D. Meador
Charlyn Stroud
Ferdinand Rosas
Ramil-Marcelo L. Mercado
Mark Slezak
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