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S.H. Yang
S.H. Yang
TSMC
Boron
Dry etching
Plasma processing
Plasma cleaning
Reactive-ion etching
2
Papers
3
Citations
0
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7nm Mobile SoC and 5G Platform Technology and Design Co-Development for PPA and Manufacturability
2019
VLSIT | Symposium on VLSI Technology
Ming Cai
Hyunwoo Park
Jackie Yang
Youseok Suh
Jun Chen
Yandong Gao
Lunwei Chang
John Jianhong Zhu
Seung Chul Song
Jihong Choi
Gary Chen
Bo Yu
Xiao-Yong Wang
Vincent Huang
Gudoor Reddy
Nagaraj Kelageri
David Anthony Kidd
Paul Ivan Penzes
Wayne Chung
S.H. Yang
Sang-Hyeob Lee
B.Z. Tien
Giri Nallapati
Sy Wu
P. R. Chidambaram
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Citations (2)
The Effect of the Effective Channel Length Induced by Plasma Etching
1996
PPID | International Symposium on Plasma Process-Induced Damage
S.H. Yang
C.Y. Lan
S.L. Pang
B. J. Chang
K. L. Lu
J. S. Liu
J.-J. Yang
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Citations (1)
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