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The Effect of the Effective Channel Length Induced by Plasma Etching
The Effect of the Effective Channel Length Induced by Plasma Etching
1996
S.H. Yang
C.Y. Lan
S.L. Pang
B. J. Chang
K. L. Lu
J. S. Liu
J.-J. Yang
Keywords:
Boron
Dry etching
Plasma processing
Plasma cleaning
Reactive-ion etching
Analytical chemistry
Plasma etcher
Etching (microfabrication)
Plasma etching
Materials science
Optoelectronics
Silicon
Correction
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