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K. Tokashiki
K. Tokashiki
Electronic engineering
Etching
Engineering
Oxide
Optoelectronics
6
Papers
23
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Accurate gate CD control for 130 nm CMOS technology node
2003
ISSM | International Symposium on Semiconductor Manufacturing
M Nagase
K Yokota
A. Mituiki
K. Tokashiki
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Citations (1)
Dry etching of bottom anti-reflective-coat and its application to gate length control
1997
ISSM | International Symposium on Semiconductor Manufacturing
A. Nishizawa
K. Tokashiki
S. Horiba
H. Miyamoto
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Reliability of thin gate oxide under plasma charging caused by antenna topography-dependent electron shading effect
1997
IEDM | International Electron Devices Meeting
K. Noguchi
K. Tokashiki
T. Horiuchi
H. Miyamoto
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Citations (10)
Two-dimensional borderless contact pad technology for a 0.135 /spl mu/m/sup 2/ 4-gigabit DRAM cell
1997
IEDM | International Electron Devices Meeting
H. Koga
Naoki Kasai
Toru Tatsumi
Yasuhide Hayashi
Yukishige Saito
K. Nakajima
Katsuto Tokunaga
N. Onoda
K. Tokashiki
A. Nishizawa
H. Kawamoto
Kuniaki Koyama
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Citations (4)
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