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E. Augendre
E. Augendre
IMEC
Electronic engineering
CMOS
Leakage (electronics)
Ion implantation
Dielectric
2
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48
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Impact of Stochastic Mismatch on Measured SRAM Performance of FinFETs with Resist/Spacer-Defined Fins: Role of Line-Edge-Roughness
2006
IEDM | International Electron Devices Meeting
A. Dixit
K.G. Anil
Emanuele Baravelli
Ph. Roussel
Abdelkarim Mercha
C. Gustin
M. Bamal
E. Grossar
Rita Rooyackers
E. Augendre
Malgorzata Jurczak
S. Biesemans
K. De Meyer
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Citations (41)
Demonstration of a New Approach Towards 0.25V Low-Vt CMOS Using Ni-Based FUSI
2006
VLSIT | Symposium on VLSI Technology
HongYu Yu
Jorge Kittl
A. Lauwers
R. Singanamalla
C. Demeurisse
Stefan Kubicek
E. Augendre
Anabela Veloso
S. Brus
C. Vrancken
T. Y. Hoffmann
S. Mertens
Bart Onsia
R. Verbeeck
M. Demand
Aude Rothchild
B. Froment
M.J.H. van Dal
K. De Meyer
Ming-Fu Li
J.D. Chen
Malgorzata Jurczak
P. P. Absil
S. Biesemans
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Citations (7)
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