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K. Ahmed
K. Ahmed
Intel
Electronic engineering
Chemistry
Deposition (law)
Dielectric
Oxide
1
Papers
9
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In Situ Process Control of Trilayer Gate-Stacks on p-Germanium With 0.85-nm EOT
2015
IEEE Electron Device Letters
Yuanxia Zheng
Ashish Agrawal
G. B. Rayner
Michael Barth
K. Ahmed
Suman Datta
Roman Engel-Herbert
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Citations (9)
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