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Wayne P. Shen
Wayne P. Shen
Hewlett-Packard
Engineering
Reticle
Engineering drawing
Aerial image
Optical proximity correction
5
Papers
2
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0
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Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability
1998
Eli Almog
Roger F. Caldwell
Fang Cheng Chang
J. Fung Chen
Nigel R. Farrar
Linard Karklin
Thomas Laidig
Saeed Sabouri
Wayne P. Shen
Wolfgang Staud
Clive Wu
Jeremy Zelenko
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Half-multiphase printing: a proposed throughput improvement on MEBES 4500
1998
Wayne P. Shen
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Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities
1998
Duane Dutton
Wayne P. Shen
Richard Yee
James A Reynolds
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Achieving sub-half-micron I-line manufacturability through automated OPC
1997
Mario Garza
Eric Jackson
Wayne P. Shen
Nicholas K. Eib
Saeed Sabouri
Uwe Hollerbach
Theron L. Felmlee
Vijaya N.V. Raghavan
K. C. Wang
Eytan Barouch
Steven A. Orszag
Keith K. Chao
John V. Jensen
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Achieving sub-half-micron i-line manufacturability through automated OPC
1997
Mario Garza
Eric Jackson
Wayne P. Shen
Nicholas K. Eib
Saeed Sabouri
Uwe Hollerbach
Theron L. Felmlee
Vijaya N.V. Raghavan
K. C. Wang
Eytan Barouch
Steven A. Orszag
Keith K. Chao
John V. Jensen
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Citations (2)
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