Half-multiphase printing: a proposed throughput improvement on MEBES 4500

This paper proposes a simple writing method, named 'half multiphase printing,' to improve the throughput of the MEBES 4500 raster-scan photomask writer by 40 - 50% while maintaining the same edge accuracy. The concept is simple and easy to apply. It is expected to be a very useful writing mode, especially for those applications with 0.25 - 0.35 micrometer design rules where 0.04 - 0.08 micrometer design grids and PBS resist are still widely used throughout the industry.