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Hisashi Ohba
Hisashi Ohba
Atomic layer deposition
Remote plasma
Analytical chemistry
Chemistry
Materials science
3
Papers
4
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0
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Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
2015
Journal of Vacuum Science and Technology
Kensaku Kanomata
Hisashi Ohba
P. Pungboon Pansila
Bashir Ahmmad
Shigeru Kubota
Kazuhiro Hirahara
Fumihiko Hirose
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Citations (4)
RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
2015
Kensaku Kanomata
P. Pungboon Pansila
Hisashi Ohba
Bashir Ahmmad
Shigeru Kubota
Kazuhiro Hirahara
Fumihiko Hirose
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Room-Temperature Atomic Layer Deposition of HfO 2 By Using Remote Plasma Source
2014
Kensaku Kanomata
Hisashi Ohba
P. Pungboon Pansila
Takahiko Suzuki
Bashir Ahmmad
Shigeru Kubota
Kazuhiro Hirahara
Fumihiko Hirose
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