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Room-Temperature Atomic Layer Deposition of HfO 2 By Using Remote Plasma Source
Room-Temperature Atomic Layer Deposition of HfO 2 By Using Remote Plasma Source
2014
Kensaku Kanomata
Hisashi Ohba
P. Pungboon Pansila
Takahiko Suzuki
Bashir Ahmmad
Shigeru Kubota
Kazuhiro Hirahara
Fumihiko Hirose
Keywords:
Analytical chemistry
Atomic layer deposition
Remote plasma
Materials science
Optoelectronics
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