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F. Domart
F. Domart
Altis Semiconductor
Engineering
Electronic engineering
Oxide
Salicide
Gate oxide
2
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1
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Dual Gate oxide reliability improved by Spacer and Salicide process optimisation
2008
ASMC | Advanced Semiconductor Manufacturing Conference
Gaelle Richou
D. Ottenwaelder
Jean-Luc Baltzinger
Bruno Delahaye
F. Domart
A. Soudry
A. Coudray
J.F. Langlois
J. Liebault
D. Donnard
D. Garroux
P. Fraquet
F. Nogueira
N. Laporte
H. Lefevre
J.P. Brun
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An efficient methodology for Electrical Monitoring in manufacturing environment
2008
ASMC | Advanced Semiconductor Manufacturing Conference
F. Domart
D. Saout
F. Degand
A. Tran
A. Chauvet
J.L. Grolier
O. Richard
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