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Iou-Sheng Ke
Iou-Sheng Ke
DuPont
Optoelectronics
Materials science
Spin-½
Carbon
Photoresist
3
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0
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Reducing the absorbance of a high etch resistant spin-on carbon hardmask
2021
Anton D. Chavez
Iou-Sheng Ke
Sabrina Wong
Curtis Williamson
Li Cui
Paul J. LaBeaume
James F. Cameron
Shintaro Yamada
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Design considerations for high etch resistance spin-on carbon underlayers
2020
Li Cui
Iou-Sheng Ke
Anton Chavez
Keren Zhang
Paul LaBeaume
Suzanne Coley
Shintaro Yamada
James F. Cameron
Lei Zhang
William J. Marshall
Benjamin Foltz
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Planarized spin-on carbon hardmask
2020
Iou-Sheng Ke
Sheng Liu
Keren Zhang
Li Cui
Suzanne Coley
Shintaro Yamada
James F. Cameron
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