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Benjamin Foltz
Benjamin Foltz
DuPont
Optoelectronics
Materials science
Spin-½
Carbon
Photoresist
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Design considerations for high etch resistance spin-on carbon underlayers
2020
Li Cui
Iou-Sheng Ke
Anton Chavez
Keren Zhang
Paul LaBeaume
Suzanne Coley
Shintaro Yamada
James F. Cameron
Lei Zhang
William J. Marshall
Benjamin Foltz
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