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Hisataka Minami
Hisataka Minami
Hitachi
Oxide
Polishing
Nano-
Slurry
Calcination
2
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1
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Nano size cerium hydroxide slurry for scratch-free CMP process
2014
Takaaki Tanaka
Hisataka Minami
Toshiaki Akutsu
Tomohiro Iwano
Takahiro Hidaka
Takashi Shinoda
Haruaki Sakurai
Shigeru Nobe
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Liquide de polissage chimico-mécanique et procédé de polissage de substrat l'utilisant
2008
Hisataka Minami
Hiroshi Ono
Jin Amanokura
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