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Masayuki Ohashi
Masayuki Ohashi
Iwaki Meisei University
Epitaxy
Chemistry
Analytical chemistry
Sputtering
Sputter deposition
4
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43
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Orientation selective epitaxial growth of CeO2(100) and CeO2(110) layers on Si(100) substrates
2004
Journal of Vacuum Science and Technology
Tomoyasu Inoue
Naomichi Sakamoto
Masayuki Ohashi
Shigenari Shida
Akihiro Horikawa
Yoshiyuki Sampei
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Citations (12)
Orientation selective epitaxial growth of CeO2 layers on Si(1 0 0) substrates using reactive DC magnetron sputtering with substrate bias
2004
Journal of Crystal Growth
Tomoyasu Inoue
Masayuki Ohashi
Naomichi Sakamoto
Shigenari Shida
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Citations (23)
Origin of crystalline quality deterioration in epitaxial growth of CeO2 layers on Si substrates
2003
Journal of Vacuum Science and Technology
Tomoyasu Inoue
Naomichi Sakamoto
Akihiro Horikawa
Hirofumi Takakura
Kosei Takahashi
Masayuki Ohashi
Shigenari Shida
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Citations (6)
Studies on inclined nuclei as a cause of crystallinity deterioration in epitaxial CeO2(110) layers on Si(100) substrates
2003
Journal of Crystal Growth
Tomoyasu Inoue
Shigenari Shida
Naomichi Sakamoto
Akihiro Horikawa
Masayuki Ohashi
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Citations (2)
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