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Mitsuhiro Tachibana
Mitsuhiro Tachibana
Chemistry
Particle
Chemical vapor deposition
Surface roughness
Thermal
2
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6
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0
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Procede de formation d'une couche metallique au moyen d'un processus d'ecoulement intermittent de gaz precurseur
2004
Hideaki Yamasaki
Tsukasa Matsuda
Atsushi Gomi
Tatsuo Hatano
Mitsuhiro Tachibana
Koumei Matsuzava
Yumiko Kawano
Gert Leusink
F. R. McFeely
Sandra G. Malhotra
Andrew H. Simon
John J. Yurkas
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The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition
2001
Journal of Vacuum Science and Technology
Natsuko Ito
Tsuyoshi Moriya
Fumihiko Uesugi
Shuji Moriya
Masaru Aomori
Yoshinori Kato
Mitsuhiro Tachibana
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Citations (6)
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