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Denis Guiheux
Denis Guiheux
STMicroelectronics
Materials science
Analytical chemistry
Photoresist
Silicon
Phenomenon
8
Papers
15
Citations
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Characterization of photoresist films exposed to high-dose implantation conditions
2018
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Marion Croisy
Erwine Pargon
Cécile Jenny
C. Richard
Denis Guiheux
D. Mariolle
Christophe Poulain
Alain Campo
Nicolas Posseme
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Citations (5)
New generation of reactive pre-clean prior to barrier-seed deposition to preserve ULK integrity
2012
Microelectronic Engineering
M. Delavant
J. Guillan
D. Galpin
Sonarith Chhun
M. Juhel
Denis Guiheux
P. Jian
T.H. Ha
John C. Forster
S. Guggilla
S. Hong
B. Bozon
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Citations (2)
Post Cu-CMP Engineering Challenges for the 65 nm Technology Nodes and Beyond.
2007
Sébastien Petitdidier
Maxime Mellier
Denis Guiheux
M. Juhel
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Citations (2)
1