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Michael Kovalchick
Michael Kovalchick
Intel
Dry etching
Isotropy
Engineering
Aperture
Phase-shift mask
3
Papers
16
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Improving photomask surface properties through a combination of dry and wet cleaning steps
2004
Florence Eschbach
Daniel Tanzil
Michael Kovalchick
Uwe U. Dietze
Min Liu
Fei Xu
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Citations (16)
Technological challenges in implementation of alternating phase-shift mask
2001
W. Tsai
Qi-De Qian
Ken Mr. Buckmann
Wen-Hao Cheng
Long He
Brian Irvine
Marilyn Kamna
Yulia O. Korobko
Michael Kovalchick
Steven M. Labovitz
R.Talevi
Jeff Farnsworth
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Technological challenges in implementation of alternating Phase Shift Mask
2001
W. Tsai
Qi-De Qian
Ken Mr. Buckmann
Wen-Hao Cheng
Long He
Brian Irvine
Marilyn Kamna
Yulia O. Korobko
Michael Kovalchick
Steven M. Labovitz
R.Talevi
Jeff Farnsworth
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