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Todd Henry
Todd Henry
Applied Materials
Silicon
Electronic engineering
Materials science
Doping
Annealing (metallurgy)
3
Papers
4
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0
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Ion implant applications to enable advances in semiconductor technologies
2017
IWJT | International Workshop on Junction Technology
K.V. Rao
Hans van Meer
Kyu-Ha Shim
Hiro Ito
Todd Henry
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Citations (2)
NMOS contact engineering for CMOS scaling
2015
IWJT | International Workshop on Junction Technology
K.V. Rao
Chi-Nung Ni
Fareen Adeni Khaja
Xuebin Li
Shashank Sharma
Raymond Hung
M. Chudzik
Bingxi Wood
Kyu-Ha Shim
Todd Henry
Naushad Variam
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Cold Silicon Preamorphization Implant and Presilicide Sulfur Implant for Advanced Nickel Silicide Contacts
2014
IEEE Transactions on Electron Devices
Yi Tong
Qian Zhou
Kain Lu Low
Lan Xiang Wang
Lye Hing Chua
Thirumal Thanigaivelan
Todd Henry
Yee Chia Yeo
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Citations (2)
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