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D. Guiheux
D. Guiheux
STMicroelectronics
Passivation
Engineering
Ellipsometry
Electronic engineering
Metrology
3
Papers
2
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Full Wafer Stress Metrology for Dielectric Film Characterization: Use Case
2019
ASMC | Advanced Semiconductor Manufacturing Conference
V. Brouzet
V. Gredy
F. Chenevas-Paule
K. Le Chao
D. Guiheux
A. Laurent
V. Coutellier
Delphine Le-Cunff
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Gate Spacer Width Monitoring Study with Scatterometry Based on Spectroscopic Ellipsometry
2005
Characterization and Metrology for ULSI Technology
Vincent Vachellerie
Stephanie Kremer
A. Elazami
Pierre Morin
C Julien
D. Duca
D. Guiheux
N. Bicais
S. Pokrant
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Citations (2)
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