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Minha Seo

Seoul National University

23

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562

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Atomic layer deposited HfO2 and HfO2/TiO2 bi-layer films using a heteroleptic Hf-precursor for logic and memory applications

2011 Journal of Materials Chemistry
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The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application

2011 Journal of Applied Physics
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Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

2011 Chemistry of Materials
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Optimized Electrical Properties and Chemical Structures of SrTiO3 Thin Films on Si Using Various Interfacial Barrier Layers

2010 Journal of The Electrochemical Society
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Permittivity Enhanced Atomic Layer Deposited HfO2 Thin Films Manipulated by a Rutile TiO2 Interlayer

2010 Chemistry of Materials
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Ge2Sb2Te5 Charge Trapping Nanoislands with High-k Blocking Oxides for Charge Trap Memory

2009 Electrochemical and Solid State Letters
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Atomic Layer Deposition of TiO2 Films on Ru Buffered TiN Electrode for Capacitor Applications

2009 Journal of The Electrochemical Society
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Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO2 Dielectric Films by In Situ NH3 Injection

2009 Journal of The Electrochemical Society
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Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

2008 Advanced Materials
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Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability

2008 Journal of Materials Chemistry
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