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H. Zumaqué-Díaz
H. Zumaqué-Díaz
University of Bonn
X-ray lithography
Excimer
Photoresist
Electron-beam lithography
Atomic physics
1
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Investigations on the behaviour of C60 as a resist in X-ray lithography
2005
Applied Physics A
H. Klesper
R. Baumann
Joachim Bargon
J. Hormes
H. Zumaqué-Díaz
G. A. Kohring
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Citations (4)
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