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Ritchie Scott-McCabe
Ritchie Scott-McCabe
Hitachi
Analytical chemistry
Sputtering
Etching
Plasma
Physics
1
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3
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Anisotropic selective etching between SiGe and Si
2018
Japanese Journal of Applied Physics
Yohei Ishii
Ritchie Scott-McCabe
Alex Yu
Kazumasa Okuma
Kenji Maeda
Joseph Sebastian
Jim Manos
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Citations (3)
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