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Jeff Eisele
Jeff Eisele
Organic chemistry
Polymer
Photochemistry
Resist
Materials science
4
Papers
11
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Modified Acetal Approach to 157nm Resist Design
2002
Journal of Photopolymer Science and Technology
Sanjay Malik
Stephanie Dilocker
Jeff Eisele
Binod De
Murrae J. Bowden
Scott Scales
John Hatfield
Andrew J. Blakeney
Plamen Tzviatkov
Tadayoshi Kokubo
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Tert-Butylacrylatpolymere und ihre Verwendung in Resistzusammensetzungen
2001
Andrew J. Blakeney
Jeff Eisele
John Ferri
Sanjay Malik
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Post-Exposure Bake Temperature Considerations for High Activation Energy Resist Systems
2000
Journal of Photopolymer Science and Technology
Sanjay Malik
Jeff Eisele
Allyn Whewell
Lawrence Ferreira
Timothy Holt
Murrae J. Bowden
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Outgassing Issues in Acetal Resist Design
2000
Journal of Photopolymer Science and Technology
Murrae J. Bowden
Sanjay Malik
Larry Ferreira
Jeff Eisele
Allyn Whewell
Tadayoshi Kokubo
Yasumasa Kawabe
Tori Fujimori
Shiro Tan
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Citations (5)
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