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M. Sonsalla
M. Sonsalla
Nitrogen
Thin film
Sputtering
Analytical chemistry
Mass flow
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Composition of Ti-N films: EDX analysis during the sputtering process
1993
Fresenius Journal of Analytical Chemistry
T. Stobiecki
F. Stobiecki
B. Matthes
M. Sonsalla
F. Wittig
K. Röll
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