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Amrit K. Narasimhan
Amrit K. Narasimhan
Extreme ultraviolet lithography
Materials science
MOX fuel
Resist
Calibration
2
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2024
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Advances in defect performance in metal oxide photoresists for EUV lithography
2021
Stephen T. Meyers
Jan Doise
Michael Kocsis
Chang Shu Hao
Benjamin L. Clark
Peter De Schepper
Jason K. Stowers
Alan J. Telecky
Andrew Grenville
Amrit K. Narasimhan
Danilo De Simone
Geert Vandenberghe
Philippe Foubert
Poulomi Das
Christophe Beral
Yannick Feurprier
Tomoya Onitsuka
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Calibration of a MOx-specific EUV photoresist lithography model
2020
Craig D. Needham
Amrit K. Narasimhan
Ulrich Welling
Lawrence S. Melvin
Peter De Schepper
Joren Wouters
Joren Severi
Danilo De Simone
Stephen T. Meyers
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