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X. Mellhaoui

University of Orléans

6

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113

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Oxidation threshold in silicon etching at cryogenic temperatures

2006 Journal of Vacuum Science and Technology
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SiO x F y passivation layer in silicon cryoetching

2005
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Silicon columnar microstructures induced by an SF6/O2 plasma

2005 Journal of Physics D
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SiO{sub x}F{sub y} passivation layer in silicon cryoetching

2005 Journal of Applied Physics
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Mass Spectroscopy during Inhibitor Film Desorption from a cryogenic etching process

2004
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