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K. Courouble
K. Courouble
STMicroelectronics
Plasma
Pixel
Dielectric
Spectroscopy
Secondary ion mass spectrometry
3
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6
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0
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A Highly Reliable Back Side Illuminated Pixel against Plasma Induced Damage
2019
Y. Sacchettini
Carrere J.-P.
C Doyen
Romain Duru
K. Courouble
S. Ricq
Vincent Goiffon
Pierre Magnan
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A Highly Reliable Back Side Illuminated Pixel against Plasma Induced Damage
2019
IEDM | International Electron Devices Meeting
Yolène Sacchettini
J.-P. Carrere
C. Doyen
Romain Duru
K. Courouble
S. Ricq
Vincent Goiffon
Pierre Magnan
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Citations (1)
Depth-resolved impact of integration process on porosity and solvent diffusion in a SiOCH low-k material
2014
Journal of Porous Materials
Matthieu Lépinay
N. Djourelov
H. Marinov
Lucile Broussous
K. Courouble
Christophe Licitra
F. Bertin
Vincent Rouessac
André Ayral
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Citations (5)
1