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R. Ross
R. Ross
Freescale Semiconductor
CMOS
Electronic engineering
Materials science
Fault detection and isolation
process development
4
Papers
16
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The Role of a Physical Analysis Laboratory in a 300 mm IC Development and Manufacturing Centre
2005
Characterization and Metrology for ULSI Technology
L.F.Tz. Kwakman
N. Bicaïs-Lépinay
S. Courtas
D. Delille
M. Juhel
C. Trouiller
C. Wyon
M. de la Bardonnie
F. Lorut
R. Ross
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Citations (5)
How effective are failure analysis methods for the 65nm CMOS technology node
2005
IPFA | International Symposium on the Physical and Failure Analysis of Integrated Circuits
M. Lamy
F. Lorut
M. de la Bardonnie
R. Ross
K. Ly
C. Wyon
L.F.T. Kwakman
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Citations (8)
An Effective Failure Analysis Strategy for the Successful Introduction of New Products Designed in 90 and 65 nm CMOS Technologies
2004
F. Lorut
M. Lamy
M. de la Bardonnie
S. Fabre
R. Ross
K. Ly
C. Wyon
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Citations (3)
OBIRCH Driven Failure Analysis for Process Development of 120 nm to 65 nm Technology Nodes
2004
R. Ross
K. Ly
M. de la Bardonnie
L.F.Tz. Kwakman
F. Lorut
M. Lamy
C. Wyon
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