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OBIRCH Driven Failure Analysis for Process Development of 120 nm to 65 nm Technology Nodes
OBIRCH Driven Failure Analysis for Process Development of 120 nm to 65 nm Technology Nodes
2004
R. Ross
K. Ly
M. de la Bardonnie
L.F.Tz. Kwakman
F. Lorut
M. Lamy
C. Wyon
Keywords:
Optoelectronics
Materials science
process development
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