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H. Ryssel
H. Ryssel
Osaka University
Sputtering
Ion implantation
Gallium
Analytical chemistry
Materials science
2
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17
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Comparison of FIB-induced physical and chemical etching
1998
Y.K. Park
F. Pászti
M. Takai
C. Lehrer
L. Frey
H. Ryssel
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