Old Web
English
Sign In
Acemap
>
authorDetail
>
C Lacour
C Lacour
STMicroelectronics
Analytical chemistry
Chemical vapor deposition
Titanium nitride
Metallizing
Plasma-enhanced chemical vapor deposition
1
Papers
13
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (1)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
SILK compatibility with the IMD process using copper metallization
1999
Microelectronic Engineering
J C Maisonobe
G. Passemard
C Lacour
Ch. Lecornec
P. Motte
P. Noel
J Torres
Show All
Source
Cite
Save
Citations (13)
1