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Satoshi Shimonishi
Satoshi Shimonishi
Toshiba
Optoelectronics
Substrate (chemistry)
Physics
Erosion
Plasma
3
Papers
60
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Effect of substrate temperature on sidewall erosion in high-aspect-ratio Si hole etching employing HBr/SF6/O2 plasma
2018
Japanese Journal of Applied Physics
Itsuko Sakai
Katsunori Yahashi
Satoshi Shimonishi
Makoto Sekine
Masaru Hori
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Fabrication of Silicon-on-Nothing Structure by Substrate Engineering Using the Empty-Space-in-Silicon Formation Technique
2004
Japanese Journal of Applied Physics
Tsutomu Sato
Ichiro Mizushima
Shuichi Taniguchi
K.Takenaka
Satoshi Shimonishi
Hisataka Hayashi
Masayuki Hatano
Kazuyoshi Sugihara
Yoshitaka Tsunashima
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Citations (59)
Self-Aligned Aluminum-Gate MOSFET's Having Ultra-Shallow Junctions Formed by 450 Furnace Annealing
1993
IEICE Transactions on Electronics
Koji Kotani
Tadahiro Ohmi
Satoshi Shimonishi
Tomohiro Migita
Hideki Komori
Tadashi Shibata
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