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Roland Hampp
Roland Hampp
Materials science
Electronic engineering
Chemical vapor deposition
Semiconductor device
Composite material
5
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25
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Semiconductor device and process for their preparation
2011
Thomas Fischer
Roland Hampp
Uwe Höckele
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A process for producing insulation regions of semiconductor devices and structures thereof
2007
Marcus Culmsee
Roland Hampp
Bee Kim Hong
Chris Stapelmann
Armin Tilke
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Shallow Trench Isolation for the 45-nm CMOS Node and Geometry Dependence of STI Stress on CMOS Device Performance
2007
IEEE Transactions on Semiconductor Manufacturing
Armin Tilke
Chris Stapelmann
M. Eller
Karl-Heinz Bach
Roland Hampp
Richard Lindsay
Richard A. Conti
William C. Wille
Rakesh Jaiswal
Maria Galiano
Alok Jain
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A method of treating with ultraviolet (UV) radiation for subatmospheric-chemical vapor deposition (SACVD) of ozone-tetra-ethyl-ortho-silicate (O3-TEOS)
2007
Alois Gutmann
Roland Hampp
Jun Jung Kim
Jae Eun Park
Andre Schenk
Johnny Widodo
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STI Gap-Fill Technology with High Aspect Ratio Process for 45nm CMOS and beyond
2006
ASMC | Advanced Semiconductor Manufacturing Conference
Armin Tilke
Marcus Culmsee
Rakesh Jaiswal
Roland Hampp
Richard A. Conti
Maria Galiano
Chris Stapelmann
William C. Wille
Alok Jain
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Citations (10)
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