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Tamer Coskun
Tamer Coskun
ASML Holding
Optical proximity correction
Photolithography
Resist
Electronic engineering
Engineering
6
Papers
1
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A single-exposure approach for patterning 45nm flash/DRAM contact hole mask
2006
Ting Chen
Doug Van Den Broeke
Edita Tejnil
Stephen Hsu
Sangbong Park
Gabriel Berger
Tamer Coskun
Joep de Vocht
Noel Corcoran
J. Fung Chen
Eddy van der Heijden
Jo Finders
Andre Engelen
Robert John Socha
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Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination
2006
Ting Chen
Doug Van Den Broeke
Stephen Hsu
Sangbong Park
Gabriel Berger
Tamer Coskun
Joep de Vocht
Noel Corcoran
Fung Chen
Eddy van der Heijden
Jo Finders
Andre Engelen
Robert John Socha
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Precision process calibration and CD predictions for low- k1lithography
2006
Ting Chen
Sangbong Park
Gabriel Berger
Tamer Coskun
Joep de Vocht
Fung Chen
Linda Yu
Stephen Hsu
Doug Van Den Broeke
Robert Socha
Jungchul Park
Keith Gronlund
Todd Davis
Vince Plachecki
Tom Harris
Steve Hansen
Chuck Lambson
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Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations
2005
Ting Chen
Doug Van Den Broeke
Stephen Hsu
Michael Hsu
Sangbong Park
Gabriel Berger
Tamer Coskun
Joep de Vocht
Fung Chen
Robert John Socha
Jungchul Park
Keith Gronlund
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