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Shigemi Oono
Shigemi Oono
Engineering
Engineering drawing
Manufacturing engineering
Photolithography
Wafer
4
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2024
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Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
2005
Hideaki Sakurai
Tooru Shibata
Masamitsu Itoh
Kotaro Ooishi
Hideo Funakoshi
Yoshiki Okamoto
Shigemi Oono
Masatoshi Kaneda
Shigenori Kam
Naoya Hayashi
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Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
2005
Hideaki Sakurai
Tooru Shibata
Masamitsu Itoh
Kotaro Ooishi
Hideo Funakoshi
Yoshiki Okamoto
Shigemi Oono
Masatoshi Kaneda
Shigenori Kamei
Naoya Hayashi
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First photomask developer based on state-of-the-art wafer processing technology
2004
Peter Tichy
Takahiro Fukai
Shigenori Kamei
Hiroshi Asai
Tatsuhito Kotoda
Kazuhiro Takeshita
Tetsushi Miyamoto
Yoshiki Okamoto
Hideo Funakoshi
Shinji Koga
Shigemi Oono
Rusty Cantrell
Axel Feicke
Wolfram Porsche
Martin Tschinkl
Gaston Lee
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First photomask developer based on state of the art wafer processing technology
2004
Peter Tichy
Takahiro Fukai
Shigenori Kamei
Harry Asai
Tatsuhito Kotoda
Kazuhiro Takeshita
Tetsushi Miyamoto
Yoshiki Okamoto
Hideo Funakosh
Shinji Koga
Shigemi Oono
Rusty Cantrell
Axel Feicke
Wolfram Porsche
Martin Tschinkl
Gaston Lee
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