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    P-type GaSb and GaInSb Layers Grown By Metalorganic Vapor Phase Epitaxy Using Silane as the Dopant Source
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    Abstract:
    temperature is lowered. This is explained by the presence of second band close to the conduction band minima. Silane which is a common n type dopant in GaAs and other III-V systems is shown to behave like p type in GaInSb. P-n junction structures have been grown on GaSb substrates to fabricate TPV cells.
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    Vapor phase
    Selective embedded growth of Al x Ga 1- x As ( x ≤0.35) in grooves of patterned substrates has been achieved for the first time by low-pressure organometallic vapor phase epitaxy (LP-OMVPE). Epitaxial Al x Ga 1- x As layers are embedded only in chemically etched grooves, while no polycrystalline deposition occurs on the masked area. The layers grown in grooves with the reverse-mesa cross sections, formed in the [110] direction, are uniform in thickness and show flat-smooth surfaces throughout. These results indicate that LP-OMVPE is a very promising technique for monolithic device integration.
    Vapor phase
    Deposition
    Citations (35)
    We report the successful growth of an InN film by metalorganic vapor phase epitaxy. The film quality is found to be strongly dependent on the growth temperature and the TMIn reactant flow rate. The best quality epilayer was obtained at 375°C under a high V/III ratio growth environment. It exhibits a FWHM of the X-ray rocking curve as narrow as 96 arcsec, which explains the superior crystalline quality of our epitaxial film.
    Vapor phase
    Characterization
    Citations (27)
    InGaN epitaxial film growth has been performed on (0001) c-, (1120) a- and (1100) (see manuscript for full text) m-plane ZnO substrates by metalorganic vapor phase epitaxy in the temperature range of 550°C - 680°C. The grown layers were confirmed to be single crystalline by X-ray diffraction.
    Vapor phase
    Crystal (programming language)
    Wide-bandgap semiconductor
    Citations (5)