Effects of quality of SiO 2 mask on epitaxial lateral overgrowth of GaN by hydride vapor phase epitaxy
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Distribution of threading dislocations (TDs) in epitaxial lateral overgrowth (ELO) GaN by hydride vapor-phase epitaxy (HVPE) has been investigated. Two types of carrier gas, i.e., N2 and H2+N2, were used in the HVPE in order to change the facet structure of the ELO layer. Results of cathodoluminescence (CL) mapping and HCl vapor-phase etching revealed lower TD density in the ELO layer grown using the H2+N2 mixed carrier gas than that using the N2 carrier gas.
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Николай Иванович Комяк, организатор отечественного рентгеновского приборостроения, ученый и человек (к 90-летнему юбилею) Комяк Николай Иванович (10.10.1928-28.05.2000 гг.) родился в дер.Живоглодовичи (Минская область).Окончил факультет электронной техники ЛЭТИ им.В
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