ALD: Atomic Layer Deposition – Precise and Conformal Coating for Better Performance
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Atomic layer deposition (ALD), as a thin film deposition technique, has been explored as a viable path to improve the performance of lithium-ion batteries. However, a trade-off between the species transport (capacity) and protection (lifetime), resulting from the insulating properties of ALD films, is the key challenge in ALD technology. Here we report a breakthrough to overcome this trade-off by coating an ultra-thin conformal conductive film by ALD on the surfaces of LiMn 2 O 4 particles. The particles coated with optimized film thickness exhibit a significant improvement in capacity and cycling performance compared to uncoated and insulating ALD film (e.g., Al 2 O 3 and ZrO 2 ) coated samples both at room temperature and 55 °C for long cycling numbers.
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Transition-metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co-P films were deposited by using PH3 plasma as the phosphorus source and an extra H2 plasma step to remove excess P in the growing films. The optimized ALD process proceeded by self-limited layer-by-layer growth, and the deposited Co-P films were highly pure and smooth. The Co-P films deposited via ALD exhibited better electrochemical and photoelectrochemical hydrogen evolution reaction (HER) activities than similar Co-P films prepared by the traditional post-phosphorization method. Moreover, the deposition of ultrathin Co-P films on periodic trenches was demonstrated, which highlights the broad and promising potential application of this ALD process for a conformal coating of TMP films on complex three-dimensional (3D) architectures.
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Atomic layer deposition (ALD) has long been developed for conformal coating thin films on planar surfaces and complex structured substrates based on its unique sequential process and self-limiting surface chemistry. In general, the coated thin films can be dielectrics, semiconductors, conductors, metals, etc., while the targeted surface can vary from those of particles, wires, to deep pores, through holes, and so on. The ALD coating technique, itself, was developed from gas-phase chemical vapor deposition, but now it has been extended even to liquid phase coating/growth. Because the thickness of ALD growth is controlled in atomic level ([Formula: see text]0.1[Formula: see text]nm), it has recently been employed for producing two-dimensional (2D) materials, typically semiconducting nanosheets of transition metal dichalcogenides (TMDCs). In this paper, we briefly introduce recent progress in ALD of multifunctional oxides and 2D TMDCs with the focus being placed on suitable ALD precursors and their ALD processes (for both binary compounds and ternary alloys), highlighting the remaining challenges and promising potentials.
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Abstract Physical vapor deposition (PVD) is a versatile thin‐film coating technique that can deposit a wide selection of inorganic materials at low cost. However, the process is based on line‐of‐sight transfer, which can lead to shadowing effects and limit film uniformity over nonplanar topographies. This work describes improving conformal PVD coating on polymer nanostructures by increasing surface energy using a thin oxide interlayer deposited by atomic layer deposition (ALD). The proposed ALD‐assisted PVD process allows conformal coating at low cost, and can be adopted for a wide variety of materials compatible with tradition PVD. Conformal gold films over nanostructures with 500 nm half‐pitch and aspect ratio up to 1.5 are demonstrated. The film uniformity is characterized using cross‐sectional electron microscopy, energy‐dispersive X‐ray spectroscopy, and electrical measurements, showing a clear improvement in coating uniformity with the oxide interlayer. This PVD process is then used to fabricate metallic nano‐accordion structures, which can be used for stretchable conductors. The demonstrated process can improve material selection and reduce process cost of conformal coating, which can find applications in integrated circuit manufacturing, stretchable electronics, and wearable sensors.
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In this study, the authors demonstrate the ability to apply precise, conformal W coatings onto all surfaces of nanoporous carbon aerogels using atomic layer deposition (ALD). The resulting material has a filamentous structure in which the W completely encapsulates the carbon aerogel strands. The material mass increases nonlinearly with W coating, achieving a tenfold increase following ten ALD cycles. The aerogel surface area increases by nearly a factor of 2 after ten W ALD cycles. This conformal metal coating of extremely high aspect ratio nanoporous materials by ALD represents a unique route to forming metal functionalized high surface area materials.
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Atomic layer deposition (ALD) is a self-limited growth method which relies on sequential reactions of gas phase precursor molecules with a solid surface to deposit oxides, metals and other materials in an atomic layer-by-layer fashion. The unique surface-controlled chemistry of ALD enables the conformal coating of high surface area nanoporous materials and provides atomic-level control over the coating thickness. These key advantages offer ALD the ability to precisely tune the pore size and chemical surface composition of nanoporous materials, and therefore render ALD an enabling technology for the controlled atomic-scale design of supported catalysts. Following a short introduction to the basic principles of the ALD technique, experimental studies are presented that demonstrate the ability of ALD for conformal deposition in nanometer-sized mesopores and in the bulk of high surface area powder particles. Selected examples are then discussed, illustrating the versatility of ALD for tailoring nanoporous supports and engineering the presence of catalytic sites or nanoparticles on the pore walls. A specific case study shows the potential of ALD for generating acid sites in ordered mesoporous silica materials. A second case study highlights an ALD-based approach for the synthesis of uniformly dispersed anatase nanoparticles in mesoporous silica thin films, resulting in photocatalytic activity.
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We present a method to increase the stability of DNA nanostructure templates through conformal coating with a nanometer-thin protective inorganic oxide layer created using atomic layer deposition (ALD). DNA nanotubes and origami triangles were coated with ca. 2 nm to ca. 20 nm of Al 2 O 3 . Nanoscale features of the DNA nanostructures were preserved after the ALD coating and the patterns are resistive to UV/O 3 oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films.
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