Vacuum Ultraviolet Xenon Excimer Light Source Excited by a Pulsed Jet Discharge.
Eiji FutagamiToshiaki TakadaJunji KawanakaShoichi KuboderaWataru SasakiKou KurosawaK. MitsuhashiTatsushi Igarashi
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Abstract:
We have developed a new xenon excimer light source in vacuum ultraviolet (VUV). The use of a pulsed gas jet discharge realized efficient cluster excitation and spatially localized emission in VUV with an extremely long pulse duration. An output power of 1.5 W was obtained with a pulse width of 5 ms at 176 nm, corresponding to an efficiency of 3.0%.Keywords:
Excimer
Ultraviolet
Vacuum ultraviolet
Pulse duration
Pulsed Power
Without additional fluorine donor, the Kr/Ne mixture was excited in a excimer laser with Teflon surface preionization plates. The relative UV spectrum was obtained by ways of spectrograph and scanning. The formation of KrF excimer was affirmed. The temporal characteristic of relevant spectra was analyzed. It was found that the lasting time of the KrF excimer emission is about five times as much as that of the discharge current pulse. This indicates that the main process of forming KrF excimer is harpooning reaction but the ion combined reaction that is the main process in general KrF laser.
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Fluorine
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In this paper, experimental study of two kinds of typical excimer lasers (XeCl: 308 nm, 30 ns and ArF: 193 nm,17 ns) etching PC, PI, and PMMA is described. The mechanism of excimer laser etching polymer is mainly discussed, and the performances of the two kinds of excimer lasers etching the polymers are compared.
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Since the suggestions of Gudzenko and Yakovienko,l intensive studies for photo-assisted collisions have been carried out experimentally and theoretically for various collision schemes. Previously, we have reported the formations2 of KrF excimer through photo-assisted collision between Kr and F atoms, and also its applications3 to the kinetics of KrF excimer. In the present paper, we report on a new formation process of KrF excimer induced by 248-nm photon in the laser intensity region higher than the previous works.
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A new formation process of the KrF excimer by irradiating the Kr/F 2 gas mix with KrF laser beam is reported. The formation process is assigned as a laser-induced harpooning reaction through two-photon pumping. This process has made it possible to prepare KrF excimers in highly excited vibrational states under simple and control lable conditions, and has enabled the quantitative investigation of the vibrational relaxation processes of the KrF excimer.
Excimer
Vibrational energy relaxation
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The improvement of lifetime plays important role in application and popularization of excimer lasers.Examplfying the discharge pumped XeCl excimer lasers, the laser charmber and the fast switch which have strong influence on excimer laser lifetime has been discussed.
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Recently, pulse compression of XeCl, KrF, and XeF excimer laser pulses using saturable absorbers has been reported.1 We used a similar technique to shorten pulses of the 222-nm KrCI line from a Lumonics model TE-860-2 excimer laser.
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Pulse compression
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Measurements were made of the effect of the He addition to XeF and KrF excimer lasers using fluorine-containing fuels. A monotonic decrease of laser output with increasing He was observed. The kinetic arguments of why this would be expected in this and other similar excimer laser systems are presented.
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Fluorine
Gas laser
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Vacuum ultraviolet
Excimer
Ultraviolet
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